@conference {
	title = {Reduced Complexity Nonlinear H$\infty$ Controllers: Relation to Certainty Equivalence},
	author = {Baras, John S., Patel, Nital S.},
	year = {1996},
	month = {06/1996},
	abstract = {This paper considers the problem of constructing reduced complexity controllers for output feedback nonlinear H$\infty$ control. Conditions are obtained under which such controllers achieve the closed loop performance requirements. These controllers are non-optimal in general. However, in case optimality holds, they are in fact the certainty equivalence controllers. Conditions under which certainty equivalence holds are simplified and linked to the solvability of a functional equation.},
	address = {San Francisco, CA},
	booktitle = {IFAC\&rsquo;96, 13th World Congress International Federation of Automatic Control},
	pages = {pp. 383-387}
}
@conference {
	title = {Robust Control of Semiconductor Manufacturing Processes},
	author = {Baras, John S., Patel, Nital S.},
	year = {1996},
	month = {06/1996},
	abstract = {This paper considers the control of semiconductor manufacturing processes. We start by considering the run to run control problem. We pose the problem in a risk-sensitive control framework, and derive the recursion for the information state. We then take large deviation type limits, and go on to show that the limiting information state recursion is related to that arising in solving ultimate boundedness control problems. For completeness we present the solution to the deterministic problem. The paper ends with an example involving application of run to run control to end-pointing.},
	address = {Williamsburg, VA},
	booktitle = {AMS-SIAM Summer Seminar on Mathematics of Stochastic Manufacturing Systems, Lectures in Applied Mathematics}
}
@conference {
	title = {Robust Nonlinear Control of a Rapid Thermal Processor},
	author = {Baras, John S., Patel, Nital S.},
	year = {1996},
	month = {05/1996},
	abstract = {This paper presents application of robust multivariable nonlinear control to the temperature control problem for rapid thermal processing systems. The controller designed achieves good tracking and temperature uniformity for a wide range of processing conditions.},
	address = {Los Angeles, CA},
	booktitle = {13th International Conference on Chemical Vapor Deposition (CVD-XIII)},
	pages = {pp. 171-176}
}
